LAM 810-048219-015 | High Frequency RF Power Control Module New Surplus Lam Plasma Etch OEM Spare
Product Core Brief Model: 810-048219-015 (Revision 015; predecessor Rev 004, Rev 010 cross-compatible with RF tuning register differences) Brand: LAM Research Series: Chamber RF Bias Power Conditioning Module for legacy 200/300mm plasma etch processing platforms Core Function: Regulate and condition high-frequency RF bias power for process chambers, sample RF voltage/current telemetry, execute closed-loop impedance matching,…










