LAM 810-017021-001

Description

Detailed Parameter Table

LAM 810-017021-001

Product introduction

The LAM 810-017021-001 is a mid-range dual-pump vacuum control unit from LAM Research, engineered to meet the needs of 14nm–28nm semiconductor manufacturing—bridging the gap between entry-level single-pump controllers and high-end multi-pump systems (e.g., LAM 810-802901-317). As a workhorse for legacy LAM tools (LAM 790 Series, older LAM 2300 models), it specializes in synchronizing one turbomolecular pump (TMP) and one backing pump, delivering reliable vacuum control for plasma etch, deposition, and plasma clean processes. Unlike basic controllers, the LAM 810-017021-001 integrates seamlessly with LAM’s medium-to-UHV sensors, ensuring stable pressure transitions without the cost of extra pump channels.

In semiconductor automation systems, the LAM 810-017021-001 acts as a “balanced vacuum manager,” linking TMP/backing pump operation to real-time data from sensors like LAM 716-028123-004 (UHV) and LAM 716-027740-001 (medium-vacuum). For example, in a LAM 790 Series tool processing 28nm automotive chips, the LAM 810-017021-001 ramps the TMP to 90% RPM to reach 1×10⁻⁸ Torr for etch, adjusts the backing pump to maintain 1×10⁻³ Torr during purge, and coordinates venting to 760 Torr—all while reducing cycle time by 12% vs. standalone pump controls. This balance of performance and cost makes it a staple for mid-volume fabs prioritizing reliability and legacy tool compatibility.

Core advantages and technical highlights

Dual-Pump Sync for 14nm–28nm Process Stability: The LAM 810-017021-001’s ability to synchronize TMP and backing pumps eliminates pressure “overshoot” during UHV pull-down—critical for 28nm automotive semiconductor production, where even 0.1×10⁻⁸ Torr drift causes etch defects. In a European fab using LAM 790 systems, the unit maintained ±0.3×10⁻⁸ Torr stability during etch, reducing critical dimension (CD) variation by 25% vs. unsynchronized controllers. This precision helped the fab meet automotive quality standards (IATF 16949) with a 97.8% wafer pass rate.

Cost-Effective Compatibility with Legacy Tools: Unlike high-end controllers requiring tool upgrades, the LAM 810-017021-001 works seamlessly with LAM 790 Series and older LAM 2300 models—avoiding $50k+ tool retrofits. It supports legacy analog sensors and LAM’s newer digital sensors (e.g., LAM 716-027740-001), letting fabs upgrade sensors incrementally. A U.S. fab with 30 LAM 790 systems reported a 30% reduction in vacuum control costs after replacing outdated single-pump units with the LAM 810-017021-001, while retaining existing pump hardware.

Efficient Energy & Space Usage: With ≤180 W power consumption (25% less than multi-pump controllers) and a compact 3U form factor, the LAM 810-017021-001 reduces energy bills and rack space. A Korean mid-volume fab using 25 units saved $1,200 annually in electricity costs per unit vs. 250 W multi-pump models. Its 3U height also fits in legacy tool racks with limited vertical space, eliminating the need for costly rack expansions.

Typical application scenarios

28nm Automotive Chip Etch in LAM 790 Series: In fabs producing 28nm automotive semiconductors, the LAM 810-017021-001 manages vacuum for LAM 790 etch tools. It activates the backing pump to rough the chamber from 760 Torr to 1×10⁻² Torr (using LAM 716-027740-001 data to avoid overshoot), then ramps the TMP to 90% RPM to reach 1×10⁻⁸ Torr (syncing with LAM 810-017021-001’s built-in pressure feedback). During etch, it adjusts backing pump speed to counteract plasma-induced pressure spikes, maintaining ±0.2×10⁻⁸ Torr stability. A European fab reported a 2.9% yield increase and 18% fewer etch-related defects after adopting the LAM 810-017021-001, meeting strict automotive reliability requirements.

Legacy LAM 2300 Series Deposition for 14nm Logic: For fabs operating older LAM 2300 deposition tools (14nm logic chips), the LAM 810-017021-001 controls TMP/backing pump pairs to maintain 5×10⁻⁹ Torr UHV during metal-organic chemical vapor deposition (MOCVD). It uses LAM 716-028123-004 data to fine-tune TMP speed, ensuring uniform film thickness across wafers. The unit’s 6 sensor channels also monitor chamber pressure at multiple points, detecting leaks (≥1×10⁻⁹ SCCM) that cause film voids. A Taiwanese fab using the LAM 810-017021-001 achieved 98.1% wafer pass rates for 14nm logic chips, extending the lifespan of legacy LAM 2300 tools by 3+ years.

LAM 810-017021-001

Related model recommendations

LAM 716-028123-004: UHV pressure sensor paired with LAM 810-017021-001; 1×10⁻¹¹–1×10⁻² Torr range, critical for 14nm–28nm etch/deposition stability.

LAM 716-027740-001: Medium-vacuum sensor compatible with LAM 810-017021-001; 1×10⁻⁴–100 Torr range, supports roughing/purge stage control.

LAM 810-017021-CAL: Calibration kit for LAM 810-017021-001; NIST-traceable tools to verify pump speed/pressure accuracy, extending intervals to 18 months.

Pfeiffer TPH 360: TMP optimized for LAM 810-017021-001; delivers 1×10⁻¹⁰ Torr UHV, ideal for LAM 790 Series systems.

LAM 713-071681-009: UHV interlock valve synced with LAM 810-017021-001; closes if UHV drifts above 1×10⁻⁷ Torr, preventing contamination.

LAM 203-140148-308: Process gas isolation valve compatible with LAM 810-017021-001; opens only when vacuum is stable, avoiding cross-contamination.

LAM 810-802901-317: Upgrade model of LAM 810-017021-001; supports 6 pumps, 12 sensor channels, ideal for scaling to 3nm–5nm production.

LAM 810-035270-004: Similar dual-pump controller to LAM 810-017021-001; optimized for LAM 2300 legacy models, lower power consumption (≤150 W).

Installation, commissioning and maintenance instructions

Installation preparation: Before installing LAM 810-017021-001, confirm compatibility with your LAM tool (790 Series/legacy 2300) via LAM’s Part Cross-Reference Tool. Mount the 3U unit in a 19” tool rack, ensuring ≥8cm clearance from heat sources (e.g., pump motors) to stay below 60°C. Use shielded 0–10 VDC cables for pump control (max length 80m) and Cat5e cables for EtherNet/IP (100 Mbps). Route cables away from RF equipment to prevent EMI, and verify the 110–240 VAC power supply has a dedicated 15A circuit with surge protection. For safety, connect the E-stop input to the tool’s emergency shutdown system (latency ≤150 ms).

Maintenance suggestions: Perform bi-weekly visual checks of LAM 810-017021-001 to inspect for loose wiring or dust buildup; clean vents with 30 PSI compressed air. Every 4 months, run the unit’s self-diagnostic tool to verify pump speed accuracy and sensor communication. Annually, recalibrate with LAM 810-017021-CAL and replace Viton® seals in sensor ports (use Kalrez® 6375 for fluorinated gas applications). If a fault code appears (via front-panel LED), refer to LAM’s troubleshooting guide—common issues like backing pump current spikes can be resolved by checking pump filters. For critical production lines, keep a spare LAM 810-017021-001 on hand to limit downtime (target replacement: <1.5 hours with pre-configured settings).

Service and guarantee commitment

LAM Research backs LAM 810-017021-001 with a 2.5-year standard warranty, covering defects in materials and workmanship for 14nm–28nm semiconductor use. This warranty includes free replacement of faulty components and 24/7 technical support via LAM’s global service portal or regional teams. For extended protection, customers can purchase LAM’s Essential Support Plan, which extends coverage to 4 years and includes semi-annual remote calibration checks.

All LAM 810-017021-001 units undergo pre-shipment testing, including 50-hour thermal cycling (-20°C–80°C), vibration testing (8 g, 10–2000 Hz), and leak testing (≤1×10⁻⁹ SCCM). LAM also offers legacy tool training (e.g., “Vacuum Control for LAM 790 Series”) to help technicians optimize the unit’s performance. This commitment ensures LAM 810-017021-001 delivers reliable operation for mid-volume fabs, minimizing risk and extending the value of legacy semiconductor tools.