Description
Detailed Parameter Table
| Parameter Name | Parameter Value |
| Product model | LAM 810-017012-002 |
| Manufacturer | LAM Research Corporation |
| Product category | Multi-Channel Vacuum Pressure Monitoring Module (Legacy Semiconductor Tool Clusters) |
| Electrical Performance | Input Voltage: 24 VDC (±15% tolerance); Current Consumption: ≤8 W (idle); ≤15 W (full load); Signal Output: 4× 0–5 V DC (analog, 10-bit resolution per channel); Signal Isolation: 2 kVrms (per channel) |
| Physical Dimensions | Length: 140 mm; Width: 70 mm; Height: 35 mm; Weight: 0.4 kg (0.88 lbs); Mounting Bracket: 304 stainless steel (DIN rail-compatible) |
| Interface Type | 4× vacuum pressure taps (1/8” VCR mini-fittings, one per channel); 1× power connector (4-pin terminal); 4× analog output ports (BNC, one per channel); 1× RS-485 communication port (Modbus RTU) |
| Monitoring Range | Per channel: 1×10⁻² Torr – 1×10⁻⁸ Torr (rough to high vacuum); Manual range switching (2 ranges per channel: 1×10⁻²–1×10⁻⁵ / 1×10⁻⁵–1×10⁻⁸ Torr, mechanical toggles) |
| Performance Indicators | Measurement Accuracy: ±3.2% of reading (1×10⁻²–1×10⁻⁵ Torr), ±5.8% of reading (1×10⁻⁵–1×10⁻⁸ Torr) per channel; Sampling Rate: 3 Hz per channel (simultaneous); Display Resolution: 0.01 Torr (high range), 0.000001 Torr (low range) |
| Environmental Requirements | Operating Temperature: 8°C–45°C; Storage Temperature: -15°C–60°C; Humidity: 5–85% RH (non-condensing); Vibration: ≤0.15 g (10–2000 Hz); IP Rating: IP52 (dust + drip protected) |
| Installation Method | DIN rail mount (EN 50022 standard) or panel-mount; Mounting Torque: 0.8–1.2 N·m; Clearance Requirement: ≥3 cm (for airflow) |
| Material Specifications | Enclosure: 304 Stainless Steel (electropolished, Ra ≤0.3 μm); Sensor Housings: Nickel-plated 316L stainless steel (low outgassing); Seals: Viton® FKM (–15°C–130°C, weak fluorinated compatible ≤12% NF₃/CF₄) |
| Safety Certifications | SEMI S2 (semiconductor equipment safety); CE (EMC compliance); RoHS 3.0; Overcurrent Protection: 1.2 A (self-resetting); Sensor Overload Protection: ≥1 Torr per channel |
| Compatibility | Natively supports LAM 790 Series (low-end/middle etch, 2008–2015); LAM 2300 Series (basic/standard deposition, multi-chamber); Works with inert + weak fluorinated gases |
LAM 810-801237-021
Product Introduction
LAM 810-017012-002 is a multi-channel vacuum pressure monitoring module developed by LAM Research, specifically engineered to address the centralized monitoring needs of 28nm–90nm fabs operating legacy multi-chamber tool clusters (e.g., 2-chamber LAM 790 etch systems, 4-chamber LAM 2300 deposition tools). As a key component of LAM’s Legacy Cluster Monitoring Ecosystem, LAM 810-017012-002 eliminates the inefficiency of using multiple single-channel monitors (e.g., LAM 810-017004-001) by integrating 4 independent monitoring channels into a single compact unit—reducing wiring complexity and hardware costs.
Unlike single-channel monitors limited to one vacuum point, LAM 810-017012-002 enables simultaneous tracking of up to 4 chambers, with each channel offering independent range switching and ±3.2% accuracy—critical for maintaining uniform vacuum across multi-chamber processes like 28nm automotive sensor etching. Its nickel-plated 316L sensor housings and Viton® FKM seals support ≤12% NF₃/CF₄, expanding utility beyond inert gas workflows. The built-in RS-485 port (no optional upgrade required) feeds aggregated data to legacy PLCs or SCADA systems, enabling batch-level vacuum traceability without MES overhauls. With DIN rail compatibility and a slim 140×70×35 mm form factor, LAM 810-017012-002 fits seamlessly into existing control cabinets, making it a cost-effective solution for scaling legacy cluster operations.
Core Advantages and Technical Highlights
4-Channel Centralized Monitoring for Cluster Efficiency: LAM 810-017012-002’s 4 independent channels replace 4 single-channel monitors, cutting hardware costs by 35% and wiring complexity by 60%. A Southeast Asian 28nm automotive chip fab reported that upgrading their 4-chamber LAM 2300 deposition clusters with LAM 810-017012-002 reduced cable count from 48 to 12, eliminating “cross-talk” interference between channels and reducing vacuum-related defects by 2.5% (from 5.8% to 3.3%). Simultaneous 3 Hz sampling per channel also ensures time-aligned data, enabling operators to quickly identify chamber-to-chamber variations that cause uniform issues.
Enhanced Weak Fluorinated Compatibility + Durability: With ≤12% NF₃/CF₄ resistance (higher than single-channel LAM 810-017004-001’s 10%), LAM 810-017012-002 supports mild etch processes in multi-chamber clusters. A U.S. 45nm industrial sensor fab noted that the module’s nickel-plated 316L sensors withstood 10% CF₄ exposure for 2,000+ hours without corrosion—extending sensor lifespan by 50% vs. generic multi-channel monitors. The 2 kVrms per-channel isolation also prevents interference from adjacent RF-generating chambers, maintaining ±3.2% accuracy even in dense cluster setups.
Built-In RS-485 for Aggregated Data Logging: Unlike single-channel monitors with optional RS-485, LAM 810-017012-002 includes a standard Modbus RTU port to aggregate data from all 4 channels—simplifying batch-level traceability. A Mexican 90nm resistor fab reported that LAM 810-017012-002 reduced manual data entry by 75% (from 3 hours/day to 45 minutes) by feeding unified vacuum logs to their legacy PLC. The protocol’s error-correction feature also reduces data loss by 90% vs. individual analog outputs, ensuring compliance with ISO 9001 and automotive quality standards.
Typical Application Scenarios
28nm Multi-Chamber Etch Cluster (LAM 790 Middle Series): In a medium-sized fab operating 2-chamber LAM 790 middle etch clusters for 28nm automotive power chips, LAM 810-017012-002 monitors vacuum pressure in both chambers (5×10⁻⁴ Torr ±3.2% each) during 10% NF₃ mild etch. Each channel’s independent range switching adapts to chamber-specific pressure variations, while the RS-485 port feeds aggregated data to a PLC—triggering alerts if chamber-to-chamber pressure difference exceeds 0.5×10⁻⁴ Torr. This setup reduced etch CD variation across chambers by 40% (from ±0.7 μm to ±0.42 μm) and lifted cluster throughput by 18% (via faster batch changeovers). The module’s DIN rail mount also simplified installation in the cluster’s control cabinet, avoiding $4k in custom mounting hardware.
45nm Multi-Chamber Deposition (LAM 2300 Standard Series): For a small fab using 4-chamber LAM 2300 standard deposition tools for 45nm SiO₂ dielectrics, LAM 810-017012-002 tracks pressure in each chamber (2×10⁻⁶ Torr ±5.8% each) during deposition. Its IP52 rating protects against occasional cleanroom water drips, while per-channel analog outputs feed pressure data to legacy throttle valve controllers—enabling basic closed-loop control for each chamber. The module’s centralized design allowed the fab to replace 4 single-channel monitors, cutting maintenance time by 50% (from 2 hours/week to 1 hour) and reducing spare parts inventory by 60%. The fab reported a 12% reduction in film thickness variation across chambers and a 9% increase in monthly production.
LAM 810-801237-021
Related Model Recommendations
LAM 810-017004-001: Single-channel monitor complemented by LAM 810-017012-002; Used for standalone tools, while LAM 810-017012-002 handles multi-chamber clusters in the same fab.
LAM 810-009435-001: Hybrid digital-analog control module paired with LAM 810-017012-002; Uses the module’s 4-channel data to control digital actuators (e.g., smart valves) in semi-automated cluster workflows.
LAM 853-17632-001 (Weak Fluoride Variant): Basic gas filter compatible with LAM 810-017012-002; Purifies ≤12% NF₃/CF₄ for all 4 channels, reducing sensor contamination.
LAM 839-001234-001: Entry-level MFC synced with LAM 810-017012-002; Adjusts gas flow for each chamber based on the module’s pressure readings, stabilizing vacuum in clusters.
LAM 203-140148-308 (Basic Variant): Isolation valve paired with LAM 810-017012-002; One valve per channel, closing automatically if pressure exceeds ±10% of setpoint.
LAM 718-094756-081: Legacy temperature module integrated with LAM 810-017012-002; Provides 4-channel temperature data to correlate with vacuum readings in deposition clusters.
LAM 810-006490-304: Advanced entry-level control module upgraded from LAM 810-017012-002; Adds vacuum regulation for fabs scaling cluster operations to 28nm critical workflows.
LAM 856-005678-001 (Basic Variant): Single-channel manifold paired with LAM 810-017012-002; Distributes process gases to each cluster chamber, ensuring consistent flow for uniform vacuum.
Installation, Commissioning and Maintenance Instructions
Installation preparation: Before installing LAM 810-017012-002, confirm compatibility with your LAM cluster tool (790 middle etch/2300 standard deposition, 2–4 chambers) and target gas (≤12% NF₃/CF₄). Power off the cluster and evacuate all chambers to ≤1×10⁻⁷ Torr to avoid sensor contamination. Mount the module on a DIN rail (or panel) in the control cabinet, ensuring ≥3 cm clearance from heat sources and ≥5 cm from RF-generating components. Connect each chamber’s pressure tap to the module’s 1/8” VCR fittings (use Teflon tape for sealing) and wire the 24 VDC power supply (dedicated 1.2 A circuit). Connect RS-485 to the PLC/SCADA system and configure Modbus settings (9600 bps, 8N1 parity) to enable data aggregation.
Maintenance suggestions: Conduct weekly checks of LAM 810-017012-002—verify each channel’s pressure reading matches a reference gauge (deviation ≤±3.2%/±5.8%) and inspect fittings for leaks (use helium detector for fluorinated setups). Monthly, clean the display and connectors with isopropyl alcohol; check RS-485 communication by validating data transmission for all 4 channels. Every 18 months, calibrate each channel with LAM 810-017012-CAL (multi-channel kit) and replace Viton® seals if fluorinated gas is used. For troubleshooting: if a channel shows “E2” (overload), isolate the chamber and power-cycle the module; if RS-485 fails, check cable continuity and Modbus addressing. Keep a spare LAM 810-017012-002 for critical clusters—replacement takes <20 minutes, minimizing downtime.
Service and Guarantee Commitment
LAM Research provides a 2.5-year standard warranty for LAM 810-017012-002, covering defects in multi-channel functionality, pressure accuracy, and weak fluorinated compatibility for 28nm–90nm cluster applications. This warranty includes free replacement of faulty modules, 24/5 technical support via LAM’s global portal, and access to cluster-specific calibration guides. For extended protection, customers can purchase the LAM Legacy Cluster Support Plan, which extends coverage to 5 years and includes annual on-site calibration, priority support (≤8-hour response for cluster outages), and 35% discounted spare parts (e.g., sensors, fittings).
All LAM 810-017012-002 units undergo 192-hour pre-shipment testing—including multi-channel interference checks, fluorinated gas exposure, and temperature cycling—to ensure reliability in cluster environments. LAM also offers customized training for technicians, covering multi-channel calibration and cluster-specific troubleshooting, ensuring customers fully leverage LAM 810-017012-002’s centralized monitoring capabilities to optimize legacy cluster efficiency.
