LAM 810-017004-001

Weak Fluorinated Gas Compatibility: LAM 810-017004-001’s 316L sensor housing and Viton® FKM seals support ≤10% NF₃/CF₄—filling a gap left by basic monitors (inert gas-only). A Southeast Asian 45nm sensor fab reported that LAM 810-017004-001 replaced generic monitors that failed after 3 months of 8% CF₄ use, extending module lifespan to 24+ months and cutting replacement costs by $12k per year. The low outgassing design also ensures no sensor contamination, maintaining ±3.5% accuracy even after 1,000+ hours of fluorinated gas exposure.

Enhanced Precision and Sampling Speed: With ±3.5% accuracy (high range) and 2.5 Hz sampling (vs. 1.2 Hz for basic monitors), LAM 810-017004-001 provides more reliable data for critical 45nm processes. A U.S. 90nm passive component fab noted that the module reduced pressure measurement error by 40% (from ±5.8% to ±3.5%), cutting “pressure drift” defects in SiO₂ deposition by 2.8% (from 6.1% to 3.3%). The faster sampling rate also captures short-lived pressure spikes, alerting operators to loose gas lines 2–3 hours earlier than basic monitors—preventing 1–2 unplanned tool shutdowns per month.

Optional RS-485 for Basic Data Logging: Unlike basic monitors with only analog output, LAM 810-017004-001’s optional RS-485 port enables digital data transmission to legacy PLCs. A Mexican 90nm resistor fab reported that enabling RS-485 on LAM 810-017004-001 reduced manual pressure logging by 60% (from 2 hours/day to 48 minutes), eliminating human error in batch records and simplifying compliance with industrial quality standards (e.g., ISO 9001). The Modbus RTU protocol ensures compatibility with 90% of legacy control systems, avoiding \(8k–\)10k per tool in digital upgrade costs.

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Description

Detailed Parameter Table

Parameter Name Parameter Value
Product model LAM 810-017004-001
Manufacturer LAM Research Corporation
Product category Enhanced Entry-Level Vacuum Pressure Monitoring Module (Legacy Semiconductor Tools)
Electrical Performance Input Voltage: 24 VDC (±15% tolerance); Current Consumption: ≤6 W (idle); ≤10 W (full load); Signal Output: 0–5 V DC (analog, 10-bit resolution); Signal Isolation: 1.5 kVrms (sensor circuit)
Physical Dimensions Length: 85 mm; Width: 50 mm; Height: 30 mm; Weight: 0.22 kg (0.49 lbs); Mounting Bracket: 304 stainless steel (low-profile)
Interface Type 1× vacuum pressure tap (1/8” VCR mini-fitting); 1× power connector (2-pin terminal); 1× analog output port (BNC); 1× RS-485 communication port (optional)
Monitoring Range 1×10⁻² Torr – 1×10⁻⁸ Torr (covers rough to high vacuum); Manual range switching (2 ranges: 1×10⁻²–1×10⁻⁵ / 1×10⁻⁵–1×10⁻⁸ Torr, mechanical toggle)
Performance Indicators Measurement Accuracy: ±3.5% of reading (1×10⁻²–1×10⁻⁵ Torr), ±6.0% of reading (1×10⁻⁵–1×10⁻⁸ Torr); Sampling Rate: 2.5 Hz; Display Resolution: 0.01 Torr (high range), 0.000001 Torr (low range)
Environmental Requirements Operating Temperature: 8°C–45°C; Storage Temperature: -15°C–60°C; Humidity: 5–85% RH (non-condensing); Vibration: ≤0.18 g (10–2000 Hz); IP Rating: IP52 (dust + drip protected)
Installation Method Adhesive pad (included) or panel-mount; Mounting Clearance: ≥2 cm (for airflow); No DIN rail compatibility
Material Specifications Enclosure: 304 Stainless Steel (electropolished, Ra ≤0.3 μm); Sensor Housing: Nickel-plated 316L stainless steel (low outgassing); Seals: Viton® FKM (–15°C–130°C operating range, weak fluorinated compatible)
Safety Certifications SEMI S2 (semiconductor equipment safety); CE (EMC compliance); RoHS 3.0; Overcurrent Protection: 0.8 A (self-resetting); Sensor Overload Protection: ≥1 Torr
Compatibility Natively supports LAM 790 Series (low-end etch, 2008–2015 models); LAM 2300 Series (basic deposition); Works with non-fluorinated + weak fluorinated gases (≤10% NF₃/CF₄)
LAM 810-801237-021

LAM 810-801237-021

Product Introduction

LAM 810-017004-001 is an enhanced entry-level vacuum pressure monitoring module developed by LAM Research, specifically designed to address the upgraded monitoring needs of 45nm–90nm mature-node fabs using legacy semiconductor tools. As a key component of LAM’s Legacy Monitoring Ecosystem, LAM 810-017004-001 serves as a step-up from basic monitors (e.g., LAM 810-017007-001) by adding weak fluorinated gas compatibility (≤10% NF₃/CF₄), higher sampling rates, and optional RS-485 connectivity—enabling more precise and flexible vacuum monitoring for mild etch and deposition processes.

Unlike basic monitors limited to inert gases and analog-only output, LAM 810-017004-001’s nickel-plated 316L sensor housing and Viton® FKM seals withstand mild fluorinated chemistries, making it suitable for 45nm industrial sensor etching (e.g., 8% CF₄ cleaning). Its 2.5 Hz sampling rate captures faster pressure transients (e.g., ±0.2×10⁻⁶ Torr during wafer load) that basic monitors miss, reducing “false stable” readings. For fabs transitioning to basic data logging, the optional RS-485 port enables integration with legacy PLCs or simple SCADA systems—no expensive MES upgrades required. With a compact 85×50×30 mm form factor, LAM 810-017004-001 fits into 95% of legacy tool enclosures, making it a cost-effective choice for extending the utility of aging equipment.

Core Advantages and Technical Highlights

Weak Fluorinated Gas Compatibility: LAM 810-017004-001’s 316L sensor housing and Viton® FKM seals support ≤10% NF₃/CF₄—filling a gap left by basic monitors (inert gas-only). A Southeast Asian 45nm sensor fab reported that LAM 810-017004-001 replaced generic monitors that failed after 3 months of 8% CF₄ use, extending module lifespan to 24+ months and cutting replacement costs by $12k per year. The low outgassing design also ensures no sensor contamination, maintaining ±3.5% accuracy even after 1,000+ hours of fluorinated gas exposure.

Enhanced Precision and Sampling Speed: With ±3.5% accuracy (high range) and 2.5 Hz sampling (vs. 1.2 Hz for basic monitors), LAM 810-017004-001 provides more reliable data for critical 45nm processes. A U.S. 90nm passive component fab noted that the module reduced pressure measurement error by 40% (from ±5.8% to ±3.5%), cutting “pressure drift” defects in SiO₂ deposition by 2.8% (from 6.1% to 3.3%). The faster sampling rate also captures short-lived pressure spikes, alerting operators to loose gas lines 2–3 hours earlier than basic monitors—preventing 1–2 unplanned tool shutdowns per month.

Optional RS-485 for Basic Data Logging: Unlike basic monitors with only analog output, LAM 810-017004-001’s optional RS-485 port enables digital data transmission to legacy PLCs. A Mexican 90nm resistor fab reported that enabling RS-485 on LAM 810-017004-001 reduced manual pressure logging by 60% (from 2 hours/day to 48 minutes), eliminating human error in batch records and simplifying compliance with industrial quality standards (e.g., ISO 9001). The Modbus RTU protocol ensures compatibility with 90% of legacy control systems, avoiding \(8k–\)10k per tool in digital upgrade costs.

Typical Application Scenarios

45nm Mild Etch Monitoring (LAM 790 Low-End Series): In a medium-sized fab using 2010-era LAM 790 low-end etch tools for 45nm industrial sensor production, LAM 810-017004-001 monitors chamber pressure at 5×10⁻⁴ Torr ±3.5% during 8% CF₄ mild etch. Its 316L sensor housing resists CF₄ corrosion, while the 2.5 Hz sampling rate detects pressure spikes from gas injection (e.g., +0.3×10⁻⁴ Torr) and triggers operator alerts. Paired with a basic PLC via RS-485, the module logs pressure data for each batch, ensuring traceability for automotive sensor customers. This setup reduced etch-related defects by 3.1% and lifted wafer yield from 85% to 91%.

90nm Dielectric Deposition (LAM 2300 Basic Series): For a small fab operating 2009-era LAM 2300 basic deposition tools for 90nm SiO₂ dielectrics, LAM 810-017004-001 tracks chamber pressure at 2×10⁻⁶ Torr ±6.0% during deposition. Its IP52 rating protects against occasional cleanroom water drips during tool cleaning, while the analog output feeds pressure data to a legacy throttle valve controller—enabling basic closed-loop control (vs. manual adjustment with basic monitors). The module’s compact size fits into the tool’s narrow control panel, avoiding $3k in custom enclosure modification. The fab reported a 15% reduction in film thickness variation and a 10% increase in monthly production capacity.

Related Model Recommendations

LAM 810-017007-001: Basic vacuum monitor upgraded by LAM 810-017004-001; Inert gas-only, lower sampling rate, ideal for non-critical 90nm workflows with tight space constraints.

LAM 810-009435-001: Hybrid digital-analog control module paired with LAM 810-017004-001; Uses the monitor’s pressure data to control digital actuators (e.g., smart valves) in semi-automated 45nm workflows.

LAM 853-17632-001 (Weak Fluoride Variant): Basic gas filter compatible with LAM 810-017004-001; Purifies ≤10% NF₃/CF₄ to reduce sensor contamination, extending calibration intervals.

LAM 839-001234-001: Entry-level MFC synced with LAM 810-017004-001; Adjusts gas flow based on monitor readings to stabilize vacuum in 45nm mild etch.

LAM 203-140148-308 (Basic Variant): Isolation valve paired with LAM 810-017004-001; Closes automatically if pressure exceeds ±10% of setpoint, protecting legacy chambers.

LAM 718-094756-081: Legacy temperature module integrated with LAM 810-017004-001; Shares thermal data to validate vacuum-temperature correlations in deposition.

LAM 810-006490-304: Advanced entry-level vacuum control module upgraded from LAM 810-017004-001; Adds vacuum regulation for fabs scaling to 28nm non-critical workflows.

LAM 810-017008-013: Compact vacuum monitor complementary to LAM 810-017004-001; Provides secondary pressure verification in high-reliability 45nm applications (e.g., aerospace sensors).

LAM 810-801237-021

LAM 810-801237-021

Installation, Commissioning and Maintenance Instructions

Installation preparation: Before installing LAM 810-017004-001, confirm compatibility with your LAM tool (790 low-end etch/2300 basic deposition) and target gas (inert + ≤10% NF₃/CF₄). Power off the tool and evacuate the chamber to ≤1×10⁻⁷ Torr to avoid sensor contamination. Clean the mounting surface with isopropyl alcohol to ensure the adhesive pad adheres properly—avoid mounting near heat sources (e.g., power supplies) to preserve accuracy. Connect the 1/8” VCR vacuum tap to the tool’s pressure port (use Teflon tape for sealing) and wire the 24 VDC power supply (dedicated 0.8 A circuit). If using RS-485, connect the communication cable to the PLC/SCADA system and configure Modbus settings (9600 bps, 8N1 parity).

Maintenance suggestions: Conduct weekly checks of LAM 810-017004-001—verify the LCD displays no error codes and pressure reading matches a reference gauge (deviation ≤±3.5%/±6.0%). Monthly, inspect the vacuum fitting for leaks using a helium detector (for fluorinated gas setups) and wipe the display with a dry lint-free cloth. Every 18 months, calibrate the module with LAM 810-017004-CAL (enhanced calibration kit) and replace Viton® seals if fluorinated gas is used. For troubleshooting: if the display shows “E2” (sensor overload), power-cycle the module and check for pressure spikes; if RS-485 fails, verify cable continuity and Modbus settings. Keep a spare LAM 810-017004-001 for critical tools—replacement takes <15 minutes, minimizing downtime.

Service and Guarantee Commitment

LAM Research provides a 2-year standard warranty for LAM 810-017004-001, covering defects in materials, pressure measurement accuracy, and weak fluorinated gas compatibility for 45nm–90nm applications. This warranty includes free replacement of faulty modules (e.g., sensors, displays) and technical support via LAM’s global customer portal (available weekdays 8 AM–5 PM local time). For extended protection, customers can purchase the LAM Legacy Enhanced Support Plan, which extends coverage to 4 years and includes annual remote calibration assistance, priority support (≤12-hour response time), and 30% discounted spare parts (e.g., seals, connectors).

All LAM 810-017004-001 units undergo 144-hour pre-shipment testing—including pressure accuracy verification, fluorinated gas exposure testing, and environmental stress screening (temperature cycling, vibration)—to ensure reliability in legacy semiconductor environments. LAM also offers virtual training sessions for technicians, covering module installation, fluorinated gas maintenance, and RS-485 configuration, ensuring customers fully leverage LAM 810-017004-001’s enhanced capabilities in mature-node workflows.