AMAT 0090-07135

Precision Gas Control:
  • Closed-loop PID control with 16-bit resolution.
  • Automatic temperature compensation.
Process Optimization:
  • Recipe-based flow profiling.
  • Real-time drift compensation.
Fault Protection:
  • Leak detection algorithm.
  • Over-pressure shutdown.
High Reliability:
  • Built using high-quality materials to ensure long-lasting performance and durability under harsh industrial conditions.
User-Friendly Design:
  • Easy to install and integrate into existing systems, reducing downtime and improving overall productivity.
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Part number: AMAT 0090-07135
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Description

Detailed Parameter Table

Parameter Name Parameter Value
Product model AMAT 0090-07135
Manufacturer Applied Materials (AMAT)
Product category Mass Flow Controller (MFC) Interface
Control Channels 8 independent gas lines
Flow Range 0-5000 sccm (N2 equivalent)
Accuracy ±0.8% of reading ±0.2% full scale
Response Time <500ms (0-90% FS)
Communication DeviceNet, RS-485
Power Supply 24V DC ±10%
Cleanliness Class 1 cleanroom compliant
Certifications SEMI S2, SEMI F47, CE
Dimensions (W x H x D) 10.5 cm x 15 cm x 5 cm
Weight 1.2 kg
Operating Temperature Range -20°C to +85°C
Input Voltage 24 VDC
Current Rating Up to 2 A
Protection Features Overload protection, short circuit protection
AMAT 0090-07135

AMAT 0090-07135

Product Introduction

The AMAT 0090-07135 is a high-precision mass flow controller (MFC) interface module designed for semiconductor manufacturing processes. It is part of the AMAT semiconductor equipment series and is used to ensure precise control and monitoring of gas flow in various semiconductor fabrication processes.

Core Advantages and Technical Highlights

Precision Gas Control:
  • Closed-loop PID control with 16-bit resolution.
  • Automatic temperature compensation.
Process Optimization:
  • Recipe-based flow profiling.
  • Real-time drift compensation.
Fault Protection:
  • Leak detection algorithm.
  • Over-pressure shutdown.
High Reliability:
  • Built using high-quality materials to ensure long-lasting performance and durability under harsh industrial conditions.
User-Friendly Design:
  • Easy to install and integrate into existing systems, reducing downtime and improving overall productivity.

    AMAT 0090-07135

    AMAT 0090-07135

Typical Application Scenarios

The AMAT 0090-07135 is widely used in various semiconductor manufacturing processes:
  • Etch Processes: Deep silicon etch (TSV), dielectric etch (SiO₂, Si₃N₄).
  • Deposition Processes: PECVD of SiO₂, SiN, or low-k films.
  • Chamber Cleaning: NF₃/O₂ plasma cleans.

Related Model Recommendations

  • AMAT Centura®/Endura® Platforms: Compatible with various AMAT semiconductor equipment.
  • Calibration Kit: 0190-20045 for precise calibration.

Installation, Commissioning and Maintenance Instructions

Installation Preparation:
  • Ensure the environment meets the specified temperature and humidity requirements (-20°C to +85°C).
  • Use shielded cables and proper grounding to minimize electromagnetic interference.
Maintenance Suggestions:
  • Regularly inspect connections for wear and clean the module with a static-free cloth to ensure optimal heat dissipation.
  • Perform annual full calibration and quarterly leak checks (He mass spec recommended).
  • Replace O-rings every 2 years and verify ground connections (impedance <1Ω).

Service and Guarantee Commitment

Applied Materials stands behind the quality and reliability of the 0090-07135, offering a comprehensive warranty that covers manufacturing defects and performance issues for a specified period. Their dedicated after-sales support team is available to assist with technical inquiries and provide prompt solutions to ensure minimal disruption to your operations.