Description
Detailed Parameter Table
| Parameter Name | Parameter Value |
|---|---|
| Product model | AMAT 0010-23716 |
| Manufacturer | Applied Materials (AMAT) |
| Product category | High-Temperature Measurement Device |
| Input Voltage | 115 V AC or 230 V AC |
| Output Range | Adjustable |
| Measurement Accuracy | ±1% (typical value, dependent on calibration) |
| Temperature Range | 500°C to 1200°C |
| Response Time | Fast response, suitable for real-time monitoring |
| Operating Environment | High-temperature, vacuum, or corrosive gases |
| Material | High-temperature-resistant ceramics or metal alloys |
| Interface | High-speed data transmission and control signal interaction with the PMAX system |
| Calibration | Supports in-situ or offline calibration |
| Compatibility | Compatible with AMAT PMAX systems and other specific models |
AMAT 0010-23716
Product Introduction
The AMAT 0010-23716 is a high-precision high-temperature measurement device designed for semiconductor manufacturing processes. It is part of the AMAT semiconductor equipment series and is specifically designed for high-temperature measurement in processes such as thermal oxidation, diffusion, and deposition. This device, often referred to as a pyrometer or high-temperature thermometer, provides precise temperature measurements in extreme high-temperature environments .
Core Advantages and Technical Highlights
High-Precision Sensing: Utilizes advanced infrared or spectroscopic technology to capture minute temperature changes, providing high-precision temperature measurements with an accuracy of ±1% (typical value, dependent on calibration).
Rapid Response: Features fast response speed to monitor temperature changes in real-time and promptly feedback data to the control system, facilitating timely adjustment of process parameters and ensuring process stability.
Multi-Zone Monitoring: Enables multi-zone temperature distribution monitoring with real-time feedback of process parameters, allowing comprehensive insight and control of temperature conditions throughout the process to enhance process stability and product yield.
Strong Environmental Resistance: Constructed from high-temperature-resistant ceramics or metal alloys, it adapts to harsh process environments such as high temperatures, vacuum, or corrosive gases, ensuring long-term reliability.
Data Interaction and Feedback: Supports high-speed data transmission and control signal interaction with the PMAX system to achieve closed-loop control and optimize process parameters. It also assists in diagnosing equipment anomalies and reducing process deviation risks.
Calibration Function: Supports in-situ or offline calibration to ensure long-term measurement accuracy and maintain the equipment’s high-precision measurement performance.
Modular Design: Compact and modular, it adapts to the space constraints of wafer processing chambers, enables quick replacement and maintenance, and reduces equipment downtime.
High Compatibility: Deeply integrated with AMAT PMAX emitters and heat treatment systems, it is a key component of the AMAT PMAX heat treatment product line, working in conjunction with PMAX emitters, process chambers, etc. It is also compatible with multiple wafer sizes, typically supporting 200mm and 300mm wafers to meet different production needs.
AMAT 0010-23716
Typical Application Scenarios
The AMAT 0010-23716 is widely used in various semiconductor manufacturing processes:
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Thermal Oxidation: Ensuring precise temperature control during the oxidation process.
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Diffusion: Monitoring temperature distribution during the diffusion of dopants into the semiconductor material.
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Deposition: Controlling temperature during thin-film deposition processes such as CVD and PVD .
Related Model Recommendations
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AMAT PMAX Emitter: Works in conjunction with the 0010-23716 for high-temperature processes.
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AMAT Process Chambers: Compatible with various AMAT process chambers for integrated high-temperature control.
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AMAT PMAX Systems: Complete systems that integrate the 0010-23716 for optimized high-temperature process control.
Installation, Commissioning and Maintenance Instructions
Installation Preparation: Ensure the device model matches the PMAX system. Accurately install the transmitter probe assembly in the designated position of the wafer processing chamber, ensuring firm installation to avoid displacement during high-temperature processes.
Calibration: Regularly calibrate the assembly based on usage frequency and process requirements. Calibration methods include in-situ and offline calibration; refer to the device manual to select the appropriate method.
Parameter Setting: Set measurement parameters (e.g., measurement range [typically 500°C–1200°C], measurement accuracy requirements, data acquisition frequency) through the PMAX system’s operation interface.
Operation and Monitoring: During semiconductor manufacturing processes, closely monitor real-time data feedback from the transmitter probe assembly, including temperature distribution and thermal radiation changes in each monitored area.
Service and Guarantee Commitment
Applied Materials stands behind the quality and reliability of the 0010-23716, offering a comprehensive warranty that covers manufacturing defects and performance issues for a specified period. Their dedicated after-sales support team is available to assist with technical inquiries and provide prompt solutions to ensure minimal disruption to your operations.
